METU-MEMS Facilities is an microelectronics fabrication facility for 4" and 6" wafer processing.  It has 1000 sq. meters of class 100 and class 1000 clean room area for fabrication and 300 sq. meters of class 10000 clean room area for electrical testing of IC's and active discrete components.  The factory is constructed under the supervision of VARIOPLAN-Switzerland. The factory is operated by 22 technical personnel and supported by 14 researchers from Department of Electrical and Electronics Engineering.

METU-MEMS Facilities are currently being used to develop a number of MEMS products for commercial applications, including piezoresistive pressure sensors, capacitive pressure sensors, humidity sensors , surface and bulk micromachined gyroscopes and accelerometers and also RF MEMS devices . The design team in EEE Department is working to implement various sensors using post-CMOS process, including CMOS thermopiles and uncooled infrared detector arrays. Design environment includes Cadence, CoventorWare (MEMCAD), MEMSCAP, and Ansys software tools. For more information, please click on the process capabilities and research projects.

Maximum capacity of the factory is such that 144 wafers can be processed in one shift (8 hours) per day. Considering a 2mmx2mm die production, it is possible to produce 7 million working dies per year with one shift per day (assuming an 85% yield and a 7-mask process).  Two or three shifts per day are also possible.

The technology in the factory is suitable for fabrication of various other lineer products (voltage regulators, OpAmps, etc.) and discretes (diodes, power transistors, rectifiers, thyristors, etc.). The factory has know-how packages to fabricate small signal transistors and various Analog/Linear ICs, as listed in the Product Spectrum. The facility can also be considered for fabrication of various integrated circuits, like ASICs, gate arrays, and bipolar logic gates (TTL, ECL, etc.) along with MEMS products.